IP Library › Assignment 032091/0545
Patent Assignment
Reel/Frame 032091/0545

Assignment of Assignor's Interest

Recorded: 2014-01-30 Pages: 3
Assignors
NAKAJIMA, MAKOTO
Executed: 2013-12-10
SAKUMA, DAISUKE
Executed: 2013-12-10
KANNO, YUTA
Executed: 2013-12-10
KISHIOKA, TAKAHIRO
Executed: 2013-12-10
Assignee
NISSAN CHEMICAL INDUSTRIES, LTD.
7-1, KANDA-NISHIKI-CHO 3-CHOME, CHIYODA-KU, TOKYO, 1010054, JAPAN
Covered Property (1)
Silicon-Containing Resist Underlayer Film-Forming Composition Having Sulfone Structure
Patent: 9,524,871 →
Application: 14/236,136 →
Publication: US 2014/0170855