Patent Assignment
Reel/Frame 032284/0304
Assignment of Assignor's Interest
Recorded: 2014-02-24
Pages: 6
Assignors
YAMAZAKI, SHUNPEI
Executed: 2014-02-13
TSUBUKU, MASASHI
Executed: 2014-02-18
OOTA, MASASHI
Executed: 2014-02-18
KUROSAWA, YOICHI
Executed: 2014-02-18
ISHIHARA, NORITAKA
Executed: 2014-02-18
Assignee
SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
398, HASE, ATSUGI-SHI, KANAGAWA-KEN, 243-0036, JAPAN
Covered Property
(1)
Method for Manufacturing Sputtering Target, Method for Forming Oxide Film, and Transistor