Patent Assignment
Reel/Frame 032552/0395
Assignment of Assignor's Interest
Recorded: 2014-03-28
Pages: 3
Assignors
INOUE, NAOKI
Executed: 2014-03-25
TAKIZAWA, HIROO
Executed: 2014-03-25
HIRANO, SHUJI
Executed: 2014-03-25
TSUBAKI, HIDEAKI
Executed: 2014-03-25
Assignee
FUJIFILM CORPORATION
26-30, NISHIAZABU 2-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property
(1)
Pattern-Forming Method, Electron Beam-Sensitive or Extreme Ultraviolet Radiation-Sensitive Resin Composition, Resist Film, Manufacturing Method of Electronic Device Using Them and Electronic Device