IP Library › Assignment 032620/0314
Patent Assignment
Reel/Frame 032620/0314

Assignment of Assignor's Interest

Recorded: 2014-04-07 Pages: 2
Assignors
KAKUTA, KAZUYUKI
Executed: 2014-04-03
ONOZUKA, TOSHIHIKO
Executed: 2014-03-26
MATSUI, SHIGERU
Executed: 2014-03-27
EBATA, YOSHISADA
Executed: 2014-03-27
HASEGAWA, NORIO
Executed: 2014-03-28
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI SHIMBASHI 1-CHOME, MINATO-KU, TOKYO, 105-8717, JAPAN
Covered Property (1)
Phase Shift Mask, Method of Forming Asymmetric Pattern, Method of Manufacturing Diffraction Grating, and Method of Manufacturing Semiconductor Device
Patent: 9,390,934 →
Application: 14/350,314 →
Publication: US 2014/0302679
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →