IP Library › Assignment 032714/0775
Patent Assignment
Reel/Frame 032714/0775

Assignment of Assignor's Interest

Recorded: 2014-04-21 Pages: 2
Assignors
SATO, KOHEI
Executed: 2014-02-14
MIZOBE, YUYA
Executed: 2014-02-14
OHASHI, TOMOHIRO
Executed: 2014-03-10
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHISHIMBASHI 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property (1)
Plasma Processing Apparatus and Plasma Processing Method
Patent: 9,263,313 →
Application: 14/183,552 →
Publication: US 2014/0295671
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →