Patent Assignment
Reel/Frame 033074/0714
Assignment of Assignor's Interest
Recorded: 2014-06-11
Pages: 3
Assignor
MITSUI ENGINEERING & SHIPBUILDING CO., LTD.
Executed: 2014-05-26
Assignee
JSW AFTY CORPORATION
2-35-2 HYOE, HACHIOJI CITY, TOKYO, 192-0918, JAPAN
Covered Properties
(4)
Atomic Layer Growing Apparatus
Plasma Electron Temperature Measuring Method and Device
Thin-Film Forming Device
Application:
13/635,725 →
Publication:
US 2013/0008382
Atomic Layer Deposition Apparatus and Atomic Layer Deposition Method
Application:
13/983,713 →
Publication:
US 2013/0309401
Related Assignments
(4)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Oct 2, 2008
From: TACHIBANA, HIROYUKI; MURATA, KAZUTOSHI; HATTORI, NOZOMU
To: MITSUI ENGINEERING & SHIPBUILDING CO., LTD.
Reel/Frame 021624/0651 →
Assignment of Assignor's Interest
Sep 28, 2009
From: TAKIZAWA, KAZUKI
To: MITSUI ENGINEERING &SHIPBUILDING CO., LTD.
Reel/Frame 023296/0413 →
Assignment of Assignor's Interest
Sep 18, 2012
From: HATTORI, NOZOMU; MORI, YASUNARI
To: MITSUI ENGINEERING & SHIPBUILDING CO., LTD.
Reel/Frame 028977/0243 →
Assignment of Assignor's Interest
Aug 5, 2013
From: MIYATAKE, NAOMASA
To: MITSUI ENGINEERING & SHIPBUILDING CO., LTD.
Reel/Frame 030943/0288 →