IP Library › Assignment 033414/0171
Patent Assignment
Reel/Frame 033414/0171

Assignment of Assignor's Interest

Recorded: 2014-07-29 Pages: 11
Assignors
LIU, CHIA-CHU
Executed: 2014-02-12
CHEN, KUEI-SHUN
Executed: 2014-02-12
YEH, CHIH-YANG
Executed: 2014-02-18
HUANG, TE-CHIH
Executed: 2014-03-13
LIU, WEN-HAO
Executed: 2014-02-13
CHENG, YING-CHOU
Executed: 2014-02-13
LUO, BOREN
Executed: 2014-03-13
OU, TSONG-HUA
Executed: 2014-02-13
TANG, YU-PO
Executed: 2014-02-13
HUANG, WEN-CHUN
Executed: 2014-02-13
LIU, RU-GUN
Executed: 2014-02-14
LU, SHU-JEN
Executed: 2014-07-03
LIU, YU LUN
Executed: 2014-02-18
KU, YAO-CHING
Executed: 2014-02-20
GAU, TSAI-SHENG
Executed: 2014-02-20
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
NO. 8, LI-HSIN RD. 6, SCIENCE-BASED INDUSTRIAL PARK, HSIN-CHU, 300-77, TAIWAN
Covered Property (1)
Method of Defining an Intensity Selective Exposure Photomask
Patent: 9,026,957 →
Application: 14/188,953 →
Publication: US 2014/0170537