IP Library Assignment 033478/0231
Patent Assignment
Reel/Frame 033478/0231

Assignment of Assignor's Interest

Recorded: 2014-08-06 Pages: 4
Assignors
YASUDA, ATSUSHI
Executed: 2014-05-26
MUKAI, KAZUAKI
Executed: 2014-05-26
Assignee
MITSUBISHI RAYON CO., LTD.
1-1, MARUNOUCHI 1-CHOME, CHIYODA-KU, TOKYO, JAPAN
Covered Property (1)
Method of Manufacturing Polymer for Lithography, Method of Manufacturing Resist Composition, and Method of Manufacturing Substrate Having Pattern
Patent: 9,223,213 →
Application: 14/452,983 →
Publication: US 2015/0044608
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Aug 6, 2014
From: YASUDA, ATSUSHI; MUKAI, KAZUAKI
To: MITSUBISHI RAYON CO., LTD.
Reel/Frame 033478/0778 →
Change of Name Sep 5, 2017
From: MITSUBISHI RAYON CO., LTD.
To: MITSUBISHI CHEMICAL CORPORATION
Reel/Frame 043750/0834 →