Method of manufacturing polymer for lithography, method of manufacturing resist composition, and method of manufacturing substrate having pattern
View Patent ↗[Object] Provided is a method of manufacturing a polymer for lithography having reduced residual amounts of un-reacted monomers and a poor solvent used for a purification process. [Solving Means] The method of manufacturing a polymer for lithography includes a polymerization process of obtaining a polymerization reaction solution including a polymer by polymerizing monomers in the presence of a polymerization solvent, and a purification process of obtaining a wet powder of a purified polymer by purifying the polymer in the polymerization reaction solution using a re-precipitation method, in which the purification process includes a process of filtering at a filtration differential pressure of 50 kPa or more, and the solid content of the wet powder of the purified polymer exceeds 40% by mass and is less than 65% by mass.
1. A method of manufacturing a polymer for lithography, comprising:
polymerizing one or more monomers in the presence of a polymerization solvent, to obtain a polymerization reaction solution comprising a polymer;
purifying the polymer in the polymerization reaction solution by re-precipitation, to obtain a wet powder of a purified polymer; and
dissolving the wet powder of the purified polymer in a good solvent;
wherein:
the purifying comprises filtering at a filtration differential pressure of 50 kPa or more;
a solid content of the wet powder of the purified polymer exceeds 40% by mass and is less than 65% by mass; and
a temperature of the wet powder is 40° C. or less until the wet powder of the purified polymer is dissolved in the good solvent.
2. The method of claim 1 , wherein the purifying comprises re-precipitation by mixing the polymerization reaction solution and a poor solvent, and performing a solid-liquid separation through a filtration to obtain the wet powder.
3. The method of claim 2 , further comprising obtaining the wet powder by performing one or more times of one or both of (i) a rinsing process by contacting the wet powder after the solid-liquid separation with a rinsing solvent, and then performing a deliquoring of the rinsing solvent through a filtration, and (ii) a re-slurry process by mixing the wet powder after the solid-liquid separation or the wet powder after the rinsing with the poor solvent, and then performing the solid-liquid separation through the filtration.
4. The method of claim 2 , wherein the filtration is performed under a nitrogen atmosphere.
5. The method of claim 4 , wherein the filtration performed under the nitrogen atmosphere is a pressure filtration.
6. A method of manufacturing a resist composition, the method comprising performing the method of claim 1 to obtain a polymer; and then mixing the obtained polymer and a compound generating acid by an irradiation of active rays and radiation.
7. A method of manufacturing a substrate having a pattern, the method comprising performing the method of claim 6 to obtain a resist composition; forming a resist film by applying the obtained resist composition on a side to be processed of a substrate; exposing the resist film to light to obtain an exposed resist film; and developing the exposed resist film using a developer.
8. The method of claim 3 , wherein the filtration is performed under a nitrogen atmosphere.
9. The method of claim 8 , wherein the filtration performed under the nitrogen atmosphere is a pressure filtration.