IP Library › Assignment 033589/0039
Patent Assignment
Reel/Frame 033589/0039

Change of Address

Recorded: 2014-08-21 Pages: 2
Assignor
HITACHI CHEMICAL COMPANY, LTD.
Executed: 2014-08-21
Assignee
HITACHI CHEMICAL COMPANY, LTD.
9-2, MARUNOUCHI 1-CHOME, CHIYODA-KU, TOKYO, 100-6606, JAPAN
Covered Property (1)
Polishing Liquid for Cmp and Polishing Method Using the Same
Patent: 8,853,082 →
Application: 13/519,809 →
Publication: US 2012/0315763
Related Assignments (4)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Aug 16, 2012
From: HANANO, MASAYUKI; SATOU, EIICHI; OOTA, MUNEHIRO; CHINONE, KANSHI
To: HITACHI CHEMICAL COMPANY, LTD.
Reel/Frame 028797/0491 →
Change of Name Mar 2, 2023
From: HITACHI CHEMICAL COMPANY, LTD.
To: SHOWA DENKO MATERIALS CO., LTD.
Reel/Frame 062917/0865 →
Change of Name Mar 3, 2023
From: SHOWA DENKO MATERIALS CO., LTD.
To: RESONAC CORPORATION
Reel/Frame 062946/0125 →
Change of Address Feb 14, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066599/0037 →