Patent Assignment
Reel/Frame 033741/0529
Assignment of Assignor's Interest
Recorded: 2014-09-15
Pages: 6
Assignors
KITAMURA, AKINORI
Executed: 2014-08-26
OHTAKE, HIROTO
Executed: 2014-08-26
SUZUKI, EIJI
Executed: 2014-08-28
Assignee
TOKYO ELECTRON LIMITED
3-1, AKASAKA 5-CHOME, MINATO-KU, TOKYO, 107-6325, JAPAN
Covered Property
(1)
Method of Selectively Removing a Region Formed of Silicon Oxide and Plasma Processing Apparatus