Assignment of Assignor's Interest

Recorded: 2014-09-22 Pages: 4

Assignors

OSAKI, HITOSHI

Executed: 2014-09-10

NAMAI, HAYATO

Executed: 2014-09-10

MINEGISHI, SHINYA

Executed: 2014-09-10

Assignee

JSR CORPORATION

9-2, HIGASHI-SHINBASHI 1-CHOME, MINATO-KU, TOKYO, 105-8640, JAPAN

Covered Property (1)

Resist Pattern-Forming Method and Photoresist Composition

Patent: 9,594,303 →

Application: 14/491,445 →

Publication: US 2015/0010866

Related Assignments (2)

Other recorded transfers of the patent in this record — the chain of ownership.