IP Library Assignment 033890/0171
Patent Assignment
Reel/Frame 033890/0171

Assignment of Assignor's Interest

Recorded: 2014-10-03 Pages: 5
Assignors
PLOMBON, JOHN J.
Executed: 2006-02-28
LAVOIE, ADRIEN R.
Executed: 2006-02-28
DOMINGUEZ, JUAN E.
Executed: 2006-02-28
HAN, JOSEPH H.
Executed: 2006-02-28
SIMKA, HARSONO S.
Executed: 2006-02-28
Assignee
INTEL CORPORATION
2200 MISSION COLLEGE BOULEVARD, SANTA CLARA, CALIFORNIA, 95054
Covered Property (1)
Catalytically Enhanced Atomic Layer Deposition Process
Patent: 7,354,849 →
Application: 11/365,082 →
Publication: US 2007/0202678