IP Library Assignment 033959/0654
Patent Assignment
Reel/Frame 033959/0654

Assignment of Assignor's Interest

Recorded: 2014-10-16 Pages: 7
Assignors
PARK, SANGJINE
Executed: 2013-10-03
YOON, BOUN
Executed: 2013-10-05
HAN, JEONGNAM
Executed: 2013-10-03
KWON, KEE-SANG
Executed: 2013-10-03
CHO, BYUNG-KWON
Executed: 2013-10-05
CHOI, WONSANG
Executed: 2013-10-05
Assignee
SAMSUNG ELECTRONICS CO., LTD.
129, SAMSUNG-RO, YEONGTONG-GU, GYEONGGI-DO, SUWON-SI, KOREA, REPUBLIC OF
Covered Property (1)
Semiconductor Device Having Dual Metal Silicide Layers and Method of Manufacturing the Same
Patent: 9,117,692 →
Application: 14/513,807 →
Publication: US 2015/0028423