IP Library Assignment 034021/0465
Patent Assignment
Reel/Frame 034021/0465

Assignment of Assignor's Interest

Recorded: 2014-10-23 Pages: 4
Assignors
CHEN, SHENG-WEN
Executed: 2014-07-10
LIN, YU-TING
Executed: 2014-07-10
CHANG, CHE-HAO
Executed: 2014-07-10
YOU, WEI-MING
Executed: 2014-07-10
WANG, TING-CHUN
Executed: 2014-07-10
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
NO. 8, LI-HSIN RD. 6, SCIENCE-BASED INDUSTRIAL PARK, HSIN-CHU, 300-77, TAIWAN
Covered Property (1)
Method for Forming Barrier Layer for Dielectric Layers in Semiconductor Devices
Patent: 9,508,548 →
Application: 14/231,190 →
Publication: US 2015/0279954