IP Library › Assignment 034102/0395
Patent Assignment
Reel/Frame 034102/0395

Assignment of Assignor's Interest

Recorded: 2014-11-04 Pages: 5
Assignors
OR, DAVID T.
Executed: 2014-09-30
COLLINS, JOSHUA
Executed: 2014-09-12
CHANG, MEI
Executed: 2014-09-16
Assignee
APPLIED MATERIALS, INC.
3050 BOWERS AVENUE, SANTA CLARA, CALIFORNIA, 95054
Covered Property (1)
Directional SIO2 Etch Using Plasma Pre-Treatment and High-Temperature Etchant Deposition
Patent: 9,245,769 →
Application: 14/466,808 →
Publication: US 2015/0072508