Patent Assignment
Reel/Frame 034262/0733
Assignment of Assignor's Interest
Recorded: 2014-11-25
Pages: 3
Assignors
TAKACHI, MICHIHISA
Executed: 2014-11-21
SHIMIZU, YUSUKE
Executed: 2014-11-21
OZU, TOSHIHISA
Executed: 2014-11-21
Assignee
TOKYO ELECTRON LIMITED
3-1, AKASAKA 5-CHOME, MINATO-KU, TOKYO, 107-6325, JAPAN
Covered Property
(1)
Resist Mask Processing Method Using Hydrogen Containing Plasma