Patent Assignment
Reel/Frame 034797/0727
Assignment of Assignor's Interest
Recorded: 2015-01-23
Pages: 7
Assignors
YOSHIMURA, SHOTA
Executed: 2015-01-13
SUZUKI, EIJI
Executed: 2015-01-08
KAMADA, TOMIKO
Executed: 2015-01-10
OHTAKE, HIROTO
Executed: 2015-01-06
Assignee
TOKYO ELECTRON LIMITED
3-1, AKASAKA 5-CHOME, MINATO-KU, TOKYO, 107-6325, JAPAN
Covered Property
(1)
Multilayer Film Etching Method and Plasma Processing Apparatus