Assignment of Assignor's Interest

Recorded: 2015-02-06 Pages: 4

Assignors

NAMAI, HAYATO

Executed: 2014-12-12

NAKAHARA, KAZUO

Executed: 2014-12-17

IKEDA, NORIHIKO

Executed: 2014-12-12

Assignee

JSR CORPORATION

9-2, HIGASHI-SHINBASHI 1-CHOME, MINATO-KU, TOKYO, 105-8640, JAPAN

Covered Property (1)

Photoresist Composition, Resist Pattern-Forming Method, Compound, Acid Generating Agent, and Photodegradable Base

Patent: 9,323,146 →

Application: 14/470,108 →

Publication: US 2014/0363769

Related Assignments (2)

Other recorded transfers of the patent in this record — the chain of ownership.