Patent Assignment
Reel/Frame 034949/0789
Assignment of Assignor's Interest
Recorded: 2015-02-12
Pages: 3
Assignors
HA, TAEHONG
Executed: 2015-01-22
LEI, WEI
Executed: 2015-01-22
PARK, KIE JIN
Executed: 2015-01-26
Assignee
APPLIED MATERIALS, INC.
3050 BOWERS AVENUE, SANTA CLARA, CALIFORNIA, 95054
Covered Property
(1)
Methods for Forming a Cobalt-Ruthenium Liner Layer for Interconnect Structures