IP Library Assignment 035069/0369
Patent Assignment
Reel/Frame 035069/0369

Assignment of Assignor's Interest

Recorded: 2015-03-02 Pages: 2
Assignors
TERAUCHI, HIROMITSU
Executed: 2015-02-02
IIDA, TSUTOMU
Executed: 2015-02-02
YAMAMOTO, KOICHI
Executed: 2015-02-02
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHISHIMBASHI 1-CHOME, MINATO-KU, TOKYO, 105-8717, JAPAN
Covered Property (1)
Plasma Processing Apparatus and Plasma Processing Method
Patent: 9,711,375 →
Application: 14/626,921 →
Publication: US 2015/0371876
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →