IP Library › Assignment 035072/0393
Patent Assignment
Reel/Frame 035072/0393

Assignment of Assignor's Interest

Recorded: 2015-03-03 Pages: 2
Assignors
ASAKURA, RYOJI
Executed: 2015-01-28
TAMAKI, KENJI
Executed: 2015-01-28
KAGOSHIMA, AKIRA
Executed: 2015-01-26
SHIRAISHI, DAISUKE
Executed: 2015-01-26
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHISHIMBASHI 1-CHOME, MINATO-KU, TOKYO, 105-8717, JAPAN
Covered Property (1)
Data Analysis Method for Plasma Processing Apparatus, Plasma Processing Method and Plasma Processing Apparatus
Patent: 9,324,588 →
Application: 14/625,855 →
Publication: US 2016/0020123
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →