Assignment of Assignor's Interest

Recorded: 2015-03-19 Pages: 3

Assignors

NAMAI, HAYATO

Executed: 2015-03-16

WAKAMATSU, GOJI

Executed: 2015-03-16

Assignee

JSR CORPORATION

9-2, HIGASHI-SHINBASHI 1-CHOME, MINATO-KU, TOKYO, 105-8640, JAPAN

Covered Property (1)

Composition for Film Formation, Resist Underlayer Film, and Forming Method of Resist Underlayer Film, and Pattern-Forming Method

Patent: 9,412,593 →

Application: 14/662,642 →

Publication: US 2015/0267046

Related Assignments (2)

Other recorded transfers of the patent in this record — the chain of ownership.