Change of Name

Recorded: 2015-03-27 Pages: 4

Assignor

SYNOS TECHNOLOGY, INC.

Executed: 2013-10-02

Assignee

VEECO ALD INC.

3191 LAURELVIEW COURT, FREMONT, CALIFORNIA, 94538

Covered Property (1)

Atomic Layer Deposition Using Radicals Of Gas Mixture

Application: 14/503,735 →

Publication: US 2015/0020737

Related Assignments (1)

Other recorded transfers of the patent in this record — the chain of ownership.