IP Library Assignment 035675/0001
Patent Assignment
Reel/Frame 035675/0001

Assignment of Assignor's Interest

Recorded: 2015-05-19 Pages: 4
Assignor
WIELAND, MARCO JAN-JACO
Executed: 2015-04-08
Assignee
MAPPER LITHOGRAPHY IP B.V.
COMPUTERLAAN 15, DELFT, 2628 XK, NETHERLANDS
Covered Property (1)
Proximity Effect Correction in a Charged Particle Lithography System
Patent: 9,184,026 →
Application: 14/626,891 →
Publication: US 2015/0243481
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Court Appointment May 7, 2019
From: MAPPER LITHOGRAPHY HOLDING B.V.; MAPPER LITHOGRAPHY IP B.V.; MAPPER LITHOGRAPHY B.V.
To: WITTEKAMP, J.J.
Reel/Frame 049104/0734 →
Assignment of Assignor's Interest May 7, 2019
From: WITTEKAMP, J.J.
To: ASML NETHERLANDS B.V.
Reel/Frame 049296/0606 →