IP Library › Assignment 035916/0476
Patent Assignment
Reel/Frame 035916/0476

Assignment of Assignor's Interest

Recorded: 2015-06-26 Pages: 3
Assignors
LEE, BYUNG CHEOL
Executed: 2015-05-14
KIM, DONGWOOK
Executed: 2015-05-14
PAK, SANG WOO
Executed: 2015-05-14
PARK, HYUNG DAL
Executed: 2015-05-14
Assignee
INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY
17 HAENGDANG-DONG, SEONGDONG-GU, SEOUL, 133-791, KOREA, REPUBLIC OF
Covered Property (1)
Method of Manufacturing Resistance Change Layer Using Irradiation of Electron Beam and Resistive Random Access Memory Device Using the Same
Patent: 9,337,425 →
Application: 14/230,543 →
Publication: US 2015/0044816
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Apr 1, 2014
From: KIM, EUN KYU; LEE, DONG UK; CHO, SEONG GUK; OH, GYU JIN
To: INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY
Reel/Frame 032572/0503 →