IP Library Assignment 036339/0920
Patent Assignment
Reel/Frame 036339/0920

Assignment of Assignor's Interest

Recorded: 2015-08-17 Pages: 2
Assignor
NAMAI, HAYATO
Executed: 2015-07-28
Assignee
JSR CORPORATION
9-2, HIGASHI-SHINBASHI 1-CHOME, MINATO-KU, TOKYO, 105-8640, JAPAN
Covered Property (1)
Radiation-Sensitive Resin Composition, Resist Pattern-Forming Method, Acid Diffusion Control Agent, Compound, and Method for Producing Compound
Patent: 9,529,259 →
Application: 14/827,795 →
Publication: US 2015/0355539
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Merger Mar 23, 2026
From: JSR CORPORATION
To: JICC-02, CO., LTD
Reel/Frame 075191/0149 →
Change of Name Mar 23, 2026
From: JICC-02 CO., LTD
To: JSR CORPORATION
Reel/Frame 075192/0023 →