IP Library Assignment 036524/0052
Patent Assignment
Reel/Frame 036524/0052

Assignment of Assignor's Interest

Recorded: 2015-09-09 Pages: 3
Assignors
ASAKURA, RYOJI
Executed: 2015-07-08
TAMAKI, KENJI
Executed: 2015-07-08
SHIRAISHI, DAISUKE
Executed: 2015-07-14
KAGOSHIMA, AKIRA
Executed: 2015-07-14
INOUE, SATOMI
Executed: 2015-07-14
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHISHIMBASHI 1-CHOME, MINATO-KU, TOKYO, 105-8717, JAPAN
Covered Property (1)
Plasma Processing Apparatus, Plasma Processing Method and Plasma Processing Analysis Method
Application: 14/825,098 →
Publication: US 2016/0225681
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →