IP Library › Assignment 036821/0170
Patent Assignment
Reel/Frame 036821/0170

Assignment of Assignor's Interest

Recorded: 2015-10-19 Pages: 5
Assignors
HATAKEYAMA, JUN
Executed: 2015-10-15
OHASHI, MASAKI
Executed: 2015-10-15
Assignee
SHIN-ETSU CHEMICAL CO., LTD.
6-1, OHTEMACHI 2-CHOME, CHIYODA-KU, TOKYO, JAPAN
Covered Property (1)
Patterning Process and Chemically Amplified Negative Resist Composition
Patent: 9,910,358 →
Application: 14/886,284 →
Publication: US 2016/0109803