Patent Assignment
Reel/Frame 036930/0501
Assignment of Assignor's Interest
Recorded: 2015-11-01
Pages: 4
Assignee
SAMSUNG ELECTRONICS CO., LTD.
129, SAMSUNG-RO, YEONGTONG-GU, SUWON-SI, GYEONGGI-DO, 443-742, KOREA, REPUBLIC OF
Covered Property
(1)
Method of Forming a Pattern Using Ion Beams of Bilateral Symmetry, a Method of Forming a Magnetic Memory Device Using the Same, and an Ion Beam Apparatus Generating Ion Beams of Bilateral Symmetry