IP Library › Assignment 037108/0332
Patent Assignment
Reel/Frame 037108/0332

Corrective Assignment to Correct the Assignee Name Previously Recorded at Reel: 028701 Frame: 0685. Assignor(S) Hereby Confirms the Assignment.

Recorded: 2015-11-12 Pages: 6
Assignors
LIU, ZHONGDU
Executed: 2012-08-01
YIN, GERALD ZHEYAO
Executed: 2012-08-01
Assignee
ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
188 TAIHUA ROAD, JINQIAO EXPORT PROCESSING ZONE (SOUTH AREA), PUDONG, SHANGHAI, 201201, CHINA
Covered Property (1)
Capacitive-Coupled Plasma Processing Apparatus and Method for Processing Substrate
Patent: 9,230,781 →
Application: 13/564,427 →
Publication: US 2013/0032574
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Aug 1, 2012
From: LIU, ZHONGDU; YIN, GERALD ZHEYAO
To: ADVANCED MICRO-FABRICATION EQUIPMENT INC
Reel/Frame 028701/0685 →
Change of Name Jun 3, 2019
From: ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
To: ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
Reel/Frame 049352/0507 →