IP Library › Assignment 049352/0507
Patent Assignment
Reel/Frame 049352/0507

Change of Name

Recorded: 2019-06-03 Pages: 6
Assignor
Assignee
ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
188 TAIHUA ROAD JINQIAO EXPORT PROCESSING ZONE (SOUTH AREA), SHANGHAI, 201201 PUDONG, CHINA
Covered Properties (25)
Multi-Station Decoupled Reactive Ion Etch Chamber
Patent: 9,208,998 →
Application: 13/620,654 →
Publication: US 2013/0008605
High Frequency Power Supply Device and High Frequency Power Supplying Method
Application: 14/745,273 →
Publication: US 2015/0289355
Capacitive-Coupled Plasma Processing Apparatus and Method for Processing Substrate
Patent: 9,230,781 →
Application: 13/564,427 →
Publication: US 2013/0032574
Cleaning Apparatus and Method, and Film Growth Reaction Apparatus and Method
Patent: 9,382,619 →
Application: 13/440,862 →
Publication: US 2012/0255486
Performance Enhancement of Coating Packaged Esc for Semiconductor Apparatus
Patent: 9,633,884 →
Application: 14/065,260 →
Publication: US 2014/0118880
Chemical Vapor Deposition or Epitaxial-Layer Growth Reactor and Supporter Thereof
Application: 13/681,768 →
Publication: US 2013/0125820
Coating for Performance Enhancement of Semiconductor Apparatus
Application: 14/065,323 →
Publication: US 2014/0116338
Coating Packaged Chamber Parts for Semiconductor Plasma Apparatus
Patent: 9,617,633 →
Application: 14/066,584 →
Publication: US 2014/0120312
Coating Packaged Chamber Parts for Semiconductor Plasma Apparatus
Patent: 9,951,435 →
Application: 15/445,714 →
Publication: US 2017/0241038
Gas Showerhead, Method for Making the Same and Thin Film Growth Reactor
Patent: 9,534,724 →
Application: 13/891,138 →
Publication: US 2013/0299009
Method and Device for Measuring Temperature of Substrate in Vacuum Processing Apparatus
Patent: 9,443,715 →
Application: 13/888,330 →
Publication: US 2013/0292370
Plasma Processing Method and Plasma Processing Device
Patent: 9,275,870 →
Application: 14/052,650 →
Publication: US 2014/0106572
Icp Source Design for Plasma Uniformity and Efficiency Enhancement
Patent: 9,431,216 →
Application: 14/066,631 →
Publication: US 2014/0120731
Icp Source Design for Plasma Uniformity and Efficiency Enhancement
Application: 15/207,495 →
Publication: US 2016/0322205
Method for Measuring Temperature of Film in Reaction Chamber
Patent: 9,696,209 →
Application: 14/333,477 →
Publication: US 2015/0025832
Device of Changing Gas Flow Pattern and a Wafer Processing Method and Apparatus
Application: 14/946,188 →
Publication: US 2016/0172204
Method to Improve Mocvd Reaction Process by Forming Protective Film
Application: 16/134,801 →
Publication: US 2019/0032246
Processing Chamber, Combination of Processing Chamber and Loadlock, and System for Processing Substrates
Application: 14/952,230 →
Publication: US 2016/0351429
Chemical Vapor Deposition Apparatus and Its Cleaning Method
Application: 15/139,156 →
Publication: US 2016/0319425
Electrode Structure for Icp Etcher
Application: 15/387,644 →
Publication: US 2017/0186585
Temperature Adjusting Apparatus and Method for a Focus Ring
Application: 15/385,806 →
Publication: US 2017/0186590
Multi-Zone Active-Matrix Temperature Control System and Temperature Control Method, and Electrostatic Chuck and Plasma Processing Apparatus Apply Thereof
Application: 15/380,979 →
Publication: US 2017/0186592
Plasma Reactor Having a Variable Coupling of Low Frequency Rf Power to an Annular Electrode
Application: 16/025,995 →
Publication: US 2019/0006155
Apparatus and Method for Controlling Heating of Base Within Chemical Vapour Deposition Chamber
Patent: 9,851,151 →
Application: 14/386,765 →
Publication: US 2015/0024330
Apparatus and Method for Controlling Heating of Base Within Chemical Vapour Deposition Chamber
Application: 15/851,187 →
Publication: US 2018/0112919
Related Assignments (22)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest Apr 6, 2012
From: JIANG, YINXIN; SUN, YIJUN; DU, ZHIYOU
To: ADVANCED MICRO-FABRICATION EQUIPMENT INC.
Reel/Frame 028002/0154 →
Corrective Assignment to Correct the Name of the Assignee to Advanced Micro-Fabrication Equipment Inc., Shanghai Previously Recorded on Reel 028002 Frame 0154. Assignor(S) Hereby Confirms the Name of the Assignee Is Advanced Micro-Fabrication Equipment Inc., Shanghai. Apr 13, 2012
From: JIANG, YINXIN; SUN, YIJUN; DU, ZHIYOU
To: ADVANCED MICRO-FABRICATION EQUIPMENT INC., SHANGHAI
Reel/Frame 028040/0148 →
Assignment of Assignor's Interest Aug 1, 2012
From: LIU, ZHONGDU; YIN, GERALD ZHEYAO
To: ADVANCED MICRO-FABRICATION EQUIPMENT INC
Reel/Frame 028701/0685 →
Assignment of Assignor's Interest Nov 20, 2012
From: YIN, GERALD ZHEYAO; JIANG, YONG
To: ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
Reel/Frame 029328/0387 →
Assignment of Assignor's Interest May 6, 2013
From: LI, YOUSEN; LEE, STEVEN; CHEN, DAVID ZHEHAO
To: ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
Reel/Frame 030358/0675 →
Assignment of Assignor's Interest May 9, 2013
From: JIANG, YONG; ZHOU, NING; HO, HENRY; DU, ZHIYOU
To: ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGAI
Reel/Frame 030388/0988 →
Assignment of Assignor's Interest Oct 11, 2013
From: XU, LEI; NI, TUQIANG; XI, ZHAOHUI
To: ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
Reel/Frame 031406/0806 →
Record to Correct the First Assignor's Execution Date Previously Recorded at Reel 031406, Frame 0806. Oct 18, 2013
From: XU, LEI; NI, TUQIANG; XI, ZHAOHUI
To: ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
Reel/Frame 031505/0591 →
Assignment of Assignor's Interest Oct 28, 2013
From: HE, XIAOMING; ZHANG, LI; CHEN, XINGJIAN; NI, TUQIANG
To: ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
Reel/Frame 031493/0786 →
Assignment of Assignor's Interest Oct 28, 2013
From: HE, XIAOMING; NI, TUQIANG
To: ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
Reel/Frame 031493/0525 →
Assignment of Assignor's Interest Oct 29, 2013
From: HE, XIAOMING; WAN, LEI; XU, ZHAOYANG; YANG, PING
To: ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
Reel/Frame 031504/0664 →
Assignment of Assignor's Interest Oct 29, 2013
From: XU, SONGLIN; SHI, GANG; NI, TUQIANG
To: ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
Reel/Frame 031504/0864 →
Assignment of Assignor's Interest Aug 7, 2014
From: CHEN, LU; ZHANG, CHAOQIAN; MA, YANZHONG; LI, YOUSEN
To: ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
Reel/Frame 033500/0429 →
Assignment of Assignor's Interest Sep 2, 2015
From: HAYANO, EIICH; NAKAMURA, TAKESHI; MAEKAWA, YASUNORI; IIZUKA, HIROSHI
To: PEARL KOGYO CO., LTD.; ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
Reel/Frame 036482/0019 →
Assignment of Assignor's Interest Nov 9, 2015
From: YIN, GERALD; NI, TUQIANG; CHEN, JINYUAN; QIAN, XUEYU
To: ADVANCED MICRO-FABRICATION EQUIPMENT, INC. ASIA
Reel/Frame 036996/0757 →
Assignment of Assignor's Interest Nov 11, 2015
From: ADVANCED MICRO-FABRICATION EQUIPMENT, INC. ASIA
To: ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
Reel/Frame 037017/0885 →
Corrective Assignment to Correct the Assignee Name Previously Recorded at Reel: 028701 Frame: 0685. Assignor(S) Hereby Confirms the Assignment. Nov 12, 2015
From: LIU, ZHONGDU; YIN, GERALD ZHEYAO
To: ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
Reel/Frame 037108/0332 →
Assignment of Assignor's Interest Nov 19, 2015
From: NI, TUQIANG; HUANG, ZHILIN
To: ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
Reel/Frame 037091/0645 →
Assignment of Assignor's Interest Dec 2, 2015
From: TAO, HENG; NI, TUQIANG; WANG, QIAN
To: ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
Reel/Frame 037197/0183 →
Assignment of Assignor's Interest Jul 11, 2016
From: XU, SONGLIN; SHI, GANG; NI, TUQIANG
To: ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
Reel/Frame 039127/0326 →
Assignment of Assignor's Interest Apr 7, 2017
From: HE, XIAOMING; WAN, LEI; XU, ZHAOYANG; YANG, PING
To: ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
Reel/Frame 041933/0752 →
Assignment of Assignor's Interest Sep 18, 2018
From: HE, XIAOMING; GUO, SHIPING
To: ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
Reel/Frame 046904/0310 →