Apparatus and method for controlling heating of base within chemical vapour deposition chamber

1. A method for controlling heating of a substrate in a chemical vapor deposition chamber, wherein a heater and a tray are provided in the chemical vapor deposition chamber, the tray is located near the heater and spaced apart from the heater and is configured to support the substrate, the method comprises following steps:

setting a set temperature value;

measuring a first actual temperature of a surface of the tray which supports the substrate;

generating a first control signal based on a difference between the set temperature value and the first actual temperature;

converting the first control signal into a set intermediate temperature value;

measuring a second actual temperature of an area between the surface of the tray and the heater;

generating a second control signal based on a difference between the set intermediate temperature value and the second actual temperature; and

controlling the heater to heat based on the second control signal.

2. The method according to claim 1 , wherein making the second actual temperature reach a steady state earlier than the first actual temperature.

3. The method according to claim 1 , wherein the step of measuring the first actual temperature of the surface of the tray which supports the substrate comprises measuring the first actual temperature of the surface of the tray by using an optical temperature measurement instrument based on multi-wavelength.

4. The method according to claim 1 , wherein the step of generating the first control signal comprises:

calculating a first difference value between the set temperature value and the first actual temperature; and

generating the first control signal corresponding to the first difference value based on a linear relationship or a non-linear relationship.

5. The method according to claim 1 , wherein the step of converting the first control signal into the set intermediate temperature value comprises converting the first control signal into a set intermediate temperature value corresponding to the first control signal based on a linear relationship or a non-linear relationship.

6. The method according to claim 1 , wherein the step of generating the second control signal comprises:

calculating a second difference value between the set intermediate temperature value and the second actual temperature; and

generating the second control signal corresponding to the second difference value based on a linear relationship or a non-linear relationship.

7. The method according to claim 1 , wherein the step of controlling the heater to heat based on the second control signal comprises:

converting the second control signal into a heater current; and

inputting the heater current into the heater.

8. In a chemical vapor deposition chamber having a tray supporting substrates, the tray located above a heater, a method for controlling the heater comprising:

setting a set temperature value;

measuring surface temperature of the tray;

operating a first control unit to generate a first control signal based on a difference value between the set temperature value and the surface temperature;

converting the first control signal into a set intermediate temperature value;

obtaining a measuring point temperature of an area between the tray and the heater;

operating a second control unit to generate a second control signal based on a difference between the set intermediate temperature value and the measuring point temperature; and

controlling the heater to heat based on the second control signal.

9. The method according to claim 8 , wherein measuring surface temperature of the tray comprises operating an optical temperature sensor.

10. The method according to claim 8 , wherein obtaining a measuring point temperature comprises obtaining a reading of a thermocouple.

11. The method according to claim 8 , further comprising setting the first control signal to have a linear relationship with the first difference value.

12. The method according to claim 8 , further comprising setting a linear relationship between the first control signal and the set intermediate temperature.

13. The method according to claim 8 , further comprising setting a ratio of a time constant of the first temperature control unit to a time constant of the second temperature control unit to be in the range from 3 to 10.

14. The method according to claim 8 , wherein controlling the heater comprises driving a power supply to deliver electrical current to the heater based on the second control signal.

15. The method according to claim 14 , wherein the electrical current is set to be directly proportional to the second control signal.

16. The method according to claim 8 , wherein measuring surface temperature of the tray comprises measuring at multiple different positions of upper surface of the tray.

17. The method according to claim 8 , further comprising:

setting the first control signal to have a linear relationship with the first difference value;

setting a linear relationship between the first control signal and the set intermediate temperature;

setting the second control signal to have a linear relationship based on a difference between the set intermediate temperature value and the measuring point temperature.

18. The method according to claim 17 , further comprising setting a heater current driving value to have a linear relationship to the second control signal.