IP Library › Assignment 037254/0480
Patent Assignment
Reel/Frame 037254/0480

Assignment of Assignor's Interest

Recorded: 2015-12-04 Pages: 26
Assignors
SERSHEN, MICHAEL J.
Executed: 2011-12-19
SUNDARAM, GANESH M.
Executed: 2011-12-22
COUTU, ROGER R.
Executed: 2012-02-22
BECKER, JILL S.
Executed: 2011-12-07
DALBERTH, MARK J.
Executed: 2012-02-17
Assignee
CAMBRIDGE NANOTECH, INC.
ONE KENDALL SQUARE, SUITE B7301, CAMBRIDGE, MASSACHUSETTS, 02139
Covered Properties (2)
Method for High-Velocity and Atmospheric-Pressure Atomic Layer Deposition with Substrate and Coating Head Separation Distance in the Millimeter Range
Patent: 9,567,670 →
Application: 14/584,034 →
Publication: US 2015/0275363
Atomic Layer Deposition Head
Patent: 9,783,888 →
Application: 14/957,273 →
Publication: US 2016/0115596
Related Assignments (3)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest Dec 4, 2015
From: CAMBRIDGE NANOTECH, INC.
To: SURTEK, INC.
Reel/Frame 037213/0197 →
Merger Dec 4, 2015
From: SURTEK, INC.
To: ULTRATECH, INC.
Reel/Frame 037213/0348 →
Assignment of Assignor's Interest Dec 30, 2019
From: ULTRATECH, INC.
To: VEECO INSTRUMENTS INC.
Reel/Frame 051446/0476 →