IP Library › Assignment 037492/0076
Patent Assignment
Reel/Frame 037492/0076

Assignment of Assignor's Interest

Recorded: 2016-01-14 Pages: 2
Assignors
TERAUCHI, HIROMITSU
Executed: 2015-12-25
IIDA, TSUTOMU
Executed: 2015-12-25
OOHIRABARU, YUUZOU
Executed: 2015-12-25
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHISHIMBASHI 1-CHOME, MINATO-KU,, TOKYO, JAPAN
Covered Property (1)
Plasma Processing Method and Plasma Processing Apparatus
Patent: 9,831,096 →
Application: 14/995,637 →
Publication: US 2016/0211153
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →