IP Library Assignment 037779/0622
Patent Assignment
Reel/Frame 037779/0622

Assignment of Assignor's Interest

Recorded: 2016-02-19 Pages: 3
Assignors
ISHIKAWA, DAI
Executed: 2016-02-19
FUKAZAWA, ATSUKI
Executed: 2016-02-19
Assignee
ASM IP HOLDING B.V.
VERSTERKERSTRAAT 8, ALMERE, 1322 AP, NETHERLANDS
Covered Property (1)
Method for Forming Silicon Nitride Film Selectively on Sidewalls or Flat Surfaces of Trenches
Patent: 9,754,779 →
Application: 15/048,422 →
Publication: US 2017/0243734