Patent Assignment
Reel/Frame 037829/0492
Assignment of Assignor's Interest
Recorded: 2016-02-25
Pages: 3
Assignors
KHUSNATDINOV, NIYAZ
Executed: 2016-01-26
STACHOWIAK, TIMOTHY BRIAN
Executed: 2016-01-26
LIU, WEIJUN
Executed: 2016-01-26
Assignee
CANON KABUSHIKI KAISHA
30-2, SHIMOMARUKO 3-CHOME, OHTA-KU, TOKYO, 146-8501, JAPAN
Covered Property
(1)
Substrate Pretreatment for Reducing Fill Time in Nanoimprint Lithography
Application:
15/004,679 →
Publication:
US 2017/0068159