IP Library Assignment 037913/0320
Patent Assignment
Reel/Frame 037913/0320

Assignment of Assignor's Interest

Recorded: 2016-03-07 Pages: 3
Assignors
WANG, SIAO-SHAN
Executed: 2016-01-21
CHANG, CHIN-YU
Executed: 2016-01-21
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
NO. 8, LI-HSIN RD. 6, SCIENCE-BASED INDUSTRIAL PARK, HSIN-CHU, 300-77, TAIWAN
Covered Property (1)
Post Development Treatment Method and Material For Shrinking Critical Dimension of Photoresist Layer
Application: 15/010,443 →
Publication: US 2017/0219925
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Aug 11, 2016
From: WANG, SIAO-SHAN; CHANG, CHING-YU
To: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
Reel/Frame 039409/0992 →
Assignment of Assignor's Interest Oct 6, 2016
From: WANG, SIAO-SHAN; CHANG, CHING-YU
To: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Reel/Frame 039958/0638 →