Assignment of Assignor's Interest

Recorded: 2016-03-24 Pages: 2

Assignor

NAMAI, HAYATO

Executed: 2016-03-14

Assignee

JSR CORPORATION

9-2, HIGASHI-SHINBASHI 1-CHOME, MINATO-KU, TOKYO, 105-8640, JAPAN

Covered Property (1)

Radiation-Sensitive Resin Composition and Resist Pattern-Forming Method

Patent: 9,874,816 →

Application: 15/079,753 →

Publication: US 2016/0202608

Related Assignments (2)

Other recorded transfers of the patent in this record — the chain of ownership.