Patent Assignment
Reel/Frame 039388/0005
Assignment of Assignor's Interest
Recorded: 2016-08-09
Pages: 4
Assignors
NAGAHARA, SEIJI
Executed: 2016-07-04
TAGAWA, SEIICHI
Executed: 2016-07-12
OSHIMA, AKIHIRO
Executed: 2016-07-11
Assignees
TOKYO ELECTRON LIMITED
3-1 AKASAKA 5-CHOME, MINATO-KU, TOKYO, 107-6325, JAPAN
OSAKA UNIVERSITY
1-1, YAMADAOKA, SUITA-SHI, OSAKA, 565-0871, JAPAN
Covered Property
(1)
Photosensitization Chemical-Amplification Type Resist Material, Method for Forming Pattern Using Same, Semiconductor Device, Mask for Lithography, and Template for Nanoimprinting