IP Library › Assignment 040223/0597
Patent Assignment
Reel/Frame 040223/0597

Assignment of Assignor's Interest

Recorded: 2016-11-04 Pages: 16
Assignors
BLACK, MARCIE R.
Executed: 2015-05-14
NEW ENTERPRISE ASSOCIATES 12, LP
Executed: 2015-04-16
ADAMS, TRACY
Executed: 2015-04-14
CHLEBOSKI, RICHARD
Executed: 2015-04-16
SHAW, ROBERT W., JR.
Executed: 2015-04-16
DANE SHULMAN ASSOCIATES, LLC
Executed: 2015-04-20
Assignee
ADVANCED SILICON GROUP, INC.
173 BEDFORD ROAD, LINCOLN, MASSACHUSETTS, 01773
Covered Property (1)
Double-Etch Nanowire Process
Patent: 9,783,895 →
Application: 15/206,938 →
Publication: US 2016/0319441
Related Assignments (3)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Nov 4, 2016
From: YIM, JOANNE; MILLER, JEFFREY B.; JURA, MICHAEL; BLACK, MARCIE R.
To: BANDGAP ENGINEERING, INC.
Reel/Frame 040223/0515 →
Assignment of Assignor's Interest Nov 4, 2016
From: BANDGAP ENGINEERING, INC.
To: BLACK, MARCIE R.; CHLEBOSKI, RICHARD; MASSACHUSETTS GREEN ENERGY FUND I LP; SHAW, ROBERT W., JR.
Reel/Frame 040568/0666 →
Assignment of Assignor's Interest Oct 22, 2020
From: ADVANCED SILICON GROUP, INC.
To: ADVANCED SILICON GROUP TECHNOLOGIES, LLC
Reel/Frame 054143/0197 →