Assignment of Assignor's Interest

Recorded: 2016-10-27 Pages: 3

Assignors

KHUSNATDINOV, NIYAZ

Executed: 2016-07-29

STACHOWIAK, TIMOTHY BRIAN

Executed: 2016-07-29

LIU, WEIJUN

Executed: 2016-07-29

Assignee

CANON KABUSHIKI KAISHA

30-2, SHIMOMARUKO 3-CHOME, OHTA-KU, TOKYO, 146-8501, JAPAN

Covered Property (1)

Substrate Pretreatment for Reducing Fill Time in Nanoimprint Lithography

Application: 15/195,789 →

Publication: US 2017/0066208