Patent Assignment
Reel/Frame 041175/0617
Assignment of Assignor's Interest
Recorded: 2017-02-06
Pages: 7
Assignors
PARK, HOYONG
Executed: 2017-01-20
KANG, NAMJUN
Executed: 2017-01-20
SUNG, DOUGYONG
Executed: 2017-01-25
SHIM, SEUNGBO
Executed: 2017-01-20
CHO, JUNGHYUN
Executed: 2017-01-20
CHOI, MYUNGSUN
Executed: 2017-01-20
Assignee
SAMSUNG ELECTRONICS CO., LTD.
129 SAMSUNG-RO, YEONGTONG-GU, SUWON-SI, GYEONGGI-DO, 16677, KOREA, REPUBLIC OF
Covered Property
(1)
Method of Plasma Etching and Method of Fabricating Semiconductor Device Using the Same