Patent Assignment
Reel/Frame 041179/0307
Assignment of Assignor's Interest
Recorded: 2017-02-06
Pages: 2
Assignors
IWASE, TAKU
Executed: 2016-12-13
MORI, MASAHITO
Executed: 2016-12-13
ARASE, TAKAO
Executed: 2016-12-13
YOKOGAWA, KENETSU
Executed: 2016-12-13
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI-SHIMBASHI 1-CHOME, MINATO-KU,, TOKYO, JAPAN
Covered Property
(1)
Plasma Processing Apparatus and Plasma Processing Method
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.