IP Library Assignment 041297/0887
Patent Assignment
Reel/Frame 041297/0887

Assignment of Assignor's Interest

Recorded: 2017-02-20 Pages: 2
Assignors
KANAZAWA, SHUNSUKE
Executed: 2016-12-07
NISHIMORI, YASUHIRO
Executed: 2016-12-08
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI SHIMBASHI 1-CHOME, MINATO-KU, TOKYO, 105-8717, JAPAN
Covered Property (1)
Plasma Processing Method
Patent: 9,899,241 →
Application: 15/434,562 →
Publication: US 2017/0243765
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →