IP Library › Assignment 041627/0379
Patent Assignment
Reel/Frame 041627/0379

Assignment of Assignor's Interest

Recorded: 2017-02-05 Pages: 2
Assignors
DI, ZENGFENG
Executed: 2015-02-08
ZHENG, XIAOHU
Executed: 2015-02-04
WANG, GANG
Executed: 2015-02-04
ZHANG, MIAO
Executed: 2015-02-04
WANG, XI
Executed: 2015-02-06
Assignee
SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY, CHINESE ACADEMY OF SCIENCES
NO.865, CHANGNING ROAD, CHANGNING DISTRICT,, SHANGHAI, 200050, CHINA
Covered Property (1)
Manufacturing Method of Graphene Modulated High-K Oxide and Metal Gate Mos Device
Patent: 9,601,337 →
Application: 14/423,234 →
Publication: US 2016/0005609