Patent Assignment
Reel/Frame 041667/0012
Assignment of Assignor's Interest
Recorded: 2017-03-21
Pages: 4
Assignor
NAKAYAMA, MASANORI
Executed: 2017-03-06
Assignee
HITACHI KOKUSAI ELECTRIC INC.
15-12, NISHI-SHIMBASHI 2-CHOME, MINATO-KU, TOKYO, 105-8039, JAPAN
Covered Property
(1)
Method of Manufacturing Semiconductor Device Using Plasma to Modify Surface of Silicon-Containing Films Exposed in Trench Structure, and Recording Medium
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.