Patent Assignment
Reel/Frame 041741/0257
Assignment of Assignor's Interest
Recorded: 2017-02-17
Pages: 24
Assignors
OBA, HIROSHI
Executed: 2016-02-03
SUGIYAMA, YASUHIKO
Executed: 2016-02-03
OKABE, MAMORU
Executed: 2016-02-03
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI-SHIMBASHI 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property
(1)
Plasma Ion Source and Charged Particle Beam Apparatus