Patent Assignment
Reel/Frame 042341/0710
Assignment of Assignor's Interest
Recorded: 2017-05-11
Pages: 4
Assignors
ISHIKAWA, DAI
Executed: 2017-05-10
FUKAZAWA, ATSUKI
Executed: 2017-05-10
SHIBA, EIICHIRO
Executed: 2017-05-10
UEDA, SHINYA
Executed: 2017-05-10
EBISUDANI, TAISHI
Executed: 2017-05-10
CHUN, SEUNGJU
Executed: 2017-05-10
YOO, YONGMIN
Executed: 2017-05-10
MIN, YOONKI
Executed: 2017-05-10
KIM, SEYONG
Executed: 2017-05-10
CHOI, JONGWAN
Executed: 2017-05-10
Assignee
ASM IP HOLDING B.V.
VERSTERKERSTRAAT 8, ALMERE, 1322 AP, NETHERLANDS
Covered Property
(1)
Method for Forming Silicon Nitride Film Selectively on Sidewalls or Flat Surfaces of Trenches