Patent Assignment
Reel/Frame 042635/0418
Assignment of Assignor's Interest
Recorded: 2017-06-07
Pages: 8
Assignee
TOKYO ELECTRON LIMITED
3-1, AKASAKA 5-CHOME, MINATO-KU, TOKYO, 107-6325, JAPAN
Covered Property
(1)
Processing Method of Silicon Nitride Film and Forming Method of Silicon Nitride Film